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sputtering target MoS2 99.9% for Ion Beam Sputtering
MoS2 target 99.9% Physical properties Color Black Density 4.80g/ml Melting point 1185 Technical indicators purity 99.9% Relative density >99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material M...		 2017-12-14
The DC sputtering SiC target silicon carbide Ion Beam Sputtering
SiC target 99.5% Physical properties Color Black Density 3.22g/ml Melting point 2730 Technical indicators purity 99.5% Relative density >99% Cut surface flatness 3.2Ra T...		 2017-10-31
Unbalanced magnetron sputtering target CeO2 ceric oxide
Technical indicators purity CeO2/TREO99.99%;TREO99.97% Relative density>99% Cut surface flatness 3.2Ra Tolerance ±0.1mm grain size uniform Material CeO2 Brand MAT-CN Origin Nanchang Jiangxi Specifications Size 0...		 2017-08-14
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